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Chemical vapor deposition of ruthenium and ruthenium oxide thin films for advanced complementary metal-oxide semiconductor gate electrode applications
Chemical vapor deposition of ruthenium and ruthenium oxide thin films for advanced complementary metal-oxide semiconductor gate electrode applications
Chemical vapor deposition of ruthenium and ruthenium oxide thin films for advanced complementary metal-oxide semiconductor gate electrode applications
Papadatos, F. (author) / Consiglio, S. (author) / Skordas, S. (author) / Eisenbraun, E. T. (author) / Kaloyeros, A. E. (author) / Peck, J. (author) / Thompson, D. (author) / Hoover, C. (author)
JOURNAL OF MATERIALS RESEARCH -PITTSBURGH THEN WARRENDALE- ; 19 ; 2947-2955
2004-01-01
9 pages
Article (Journal)
English
DDC:
620.11
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