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Porous extreme low k (ELk) dielectrics using a PECVD porogen approach
Porous extreme low k (ELk) dielectrics using a PECVD porogen approach
Porous extreme low k (ELk) dielectrics using a PECVD porogen approach
Favennec, L. (author) / Jousseaume, V. (author) / Rouessac, V. (author) / Fusalba, F. (author) / Durand, J. (author) / Passemard, G. (author)
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 7 ; 277-282
2004-01-01
6 pages
Article (Journal)
English
DDC:
621.38152
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