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Porous extreme low k (ELk) dielectrics using a PECVD porogen approach

Favennec, L. / Jousseaume, V. / Rouessac, V. / Fusalba, F. / Durand, J. / Passemard, G.

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Porous extreme low k (ELk) dielectrics using a PECVD porogen approach

Favennec, L. / Jousseaume, V. / Rouessac, V. / Fusalba, F. / Durand, J. / Passemard, G.

Porous extreme low k (ELk) dielectrics using a PECVD porogen approach

Favennec, L. / Jousseaume, V. / Rouessac, V. / Fusalba, F. / Durand, J. / Passemard, G.

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Check availability in my library

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Document information

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Document information

Title:

Porous extreme low k (ELk) dielectrics using a PECVD porogen approach

Contributors:

Favennec, L. (author) / Jousseaume, V. (author) / Rouessac, V. (author) / Fusalba, F. (author) / Durand, J. (author) / Passemard, G. (author)

Published in:

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 7 ; 277-282

Publication date:

2004-01-01

Size:

6 pages

ISSN:

1369-8001

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.38152

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