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Depth profiled porosity and microstructure evolution studied by positron annihilation and Raman spectroscopy in SiOCH low-k films
Depth profiled porosity and microstructure evolution studied by positron annihilation and Raman spectroscopy in SiOCH low-k films
Depth profiled porosity and microstructure evolution studied by positron annihilation and Raman spectroscopy in SiOCH low-k films
Macchi, C. (author) / Mariotto, G. (author) / Karwasz, G. P. (author) / Zecca, A. (author) / Bettonte, M. (author) / Brusa, R. S. (author)
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 7 ; 289-294
2004-01-01
6 pages
Article (Journal)
English
DDC:
621.38152
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