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Chemical vapor deposition of silicon nitride thin films from tris(diethylamino)chlorosilane

Liu, X. / Pu, X. / Li, H. / Qiu, F. / Huang, L.

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Chemical vapor deposition of silicon nitride thin films from tris(diethylamino)chlorosilane

Liu, X. / Pu, X. / Li, H. / Qiu, F. / Huang, L.

Chemical vapor deposition of silicon nitride thin films from tris(diethylamino)chlorosilane

Liu, X. / Pu, X. / Li, H. / Qiu, F. / Huang, L.

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Document information

Title:

Chemical vapor deposition of silicon nitride thin films from tris(diethylamino)chlorosilane

Contributors:

Liu, X. (author) / Pu, X. (author) / Li, H. (author) / Qiu, F. (author) / Huang, L. (author)

Published in:

MATERIALS LETTERS ; 59 ; 11-14

Publication date:

2005-01-01

Size:

4 pages

ISSN:

0167-577X

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.1105 / 530

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