Ni based silicides for 45nm CMOS and beyond: Fid-Bau Portal

Ni based silicides for 45nm CMOS and beyond

Lauwers, A. / Kittl, J. A. / Van Dal, M. J. / Chamirian, O. / Pawlak, M. A. / de Potter, M. / Lindsay, R. / Raymakers, T. / Pages, X. / Mebarki, B.

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Ni based silicides for 45nm CMOS and beyond

Lauwers, A. / Kittl, J. A. / Van Dal, M. J. / Chamirian, O. / Pawlak, M. A. / de Potter, M. / Lindsay, R. / Raymakers, T. / Pages, X. / Mebarki, B.

Ni based silicides for 45nm CMOS and beyond

Lauwers, A. / Kittl, J. A. / Van Dal, M. J. / Chamirian, O. / Pawlak, M. A. / de Potter, M. / Lindsay, R. / Raymakers, T. / Pages, X. / Mebarki, B.

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Title:

Ni based silicides for 45nm CMOS and beyond

Contributors:

Lauwers, A. (author) / Kittl, J. A. (author) / Van Dal, M. J. (author) / Chamirian, O. (author) / Pawlak, M. A. (author) / de Potter, M. (author) / Lindsay, R. (author) / Raymakers, T. (author) / Pages, X. (author) / Mebarki, B. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 114/115 ; 29-41

Publication date:

2004-01-01

Size:

13 pages

ISSN:

0921-5107

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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