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Advanced front-end processes for the 45nm CMOS technology node

Collart, E. J. / Felch, S. B. / Graoui, H. / Kirkwood, D. / Tallavarjula, S. / Berg, J. A. / Hamilton, J. / Cowern, N. E. / Kirkby, K. J.

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Advanced front-end processes for the 45nm CMOS technology node

Collart, E. J. / Felch, S. B. / Graoui, H. / Kirkwood, D. / Tallavarjula, S. / Berg, J. A. / Hamilton, J. / Cowern, N. E. / Kirkby, K. J.

Advanced front-end processes for the 45nm CMOS technology node

Collart, E. J. / Felch, S. B. / Graoui, H. / Kirkwood, D. / Tallavarjula, S. / Berg, J. A. / Hamilton, J. / Cowern, N. E. / Kirkby, K. J.

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Title:

Advanced front-end processes for the 45nm CMOS technology node

Contributors:

Collart, E. J. (author) / Felch, S. B. (author) / Graoui, H. (author) / Kirkwood, D. (author) / Tallavarjula, S. (author) / Berg, J. A. (author) / Hamilton, J. (author) / Cowern, N. E. (author) / Kirkby, K. J. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 114/115 ; 118-129

Publication date:

2004-01-01

Size:

12 pages

ISSN:

0921-5107

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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