Nanometer scale characterisation of CoSi2 and NiSi induced strain in Si by convergent beam electron diffraction: Fid-Bau Portal

Nanometer scale characterisation of CoSi2 and NiSi induced strain in Si by convergent beam electron diffraction

Benedetti, A. / Bender, H. / Torregiani, C. / Dal, M. V. / Maex, K.

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Nanometer scale characterisation of CoSi2 and NiSi induced strain in Si by convergent beam electron diffraction

Benedetti, A. / Bender, H. / Torregiani, C. / Dal, M. V. / Maex, K.

Nanometer scale characterisation of CoSi2 and NiSi induced strain in Si by convergent beam electron diffraction

Benedetti, A. / Bender, H. / Torregiani, C. / Dal, M. V. / Maex, K.

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Check availability in my library

Order at Subito €

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Document information

Title:

Nanometer scale characterisation of CoSi2 and NiSi induced strain in Si by convergent beam electron diffraction

Contributors:

Benedetti, A. (author) / Bender, H. (author) / Torregiani, C. (author) / Dal, M. V. (author) / Maex, K. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 114/115 ; 61-66

Publication date:

2004-01-01

Size:

6 pages

ISSN:

0921-5107

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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