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Nickel induced lateral crystallization behavior of amorphous silicon films

Li, J. F. / Sun, X. W. / Yu, M. B. / Qi, G. J. / Zeng, X. T.

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Nickel induced lateral crystallization behavior of amorphous silicon films

Li, J. F. / Sun, X. W. / Yu, M. B. / Qi, G. J. / Zeng, X. T.

Nickel induced lateral crystallization behavior of amorphous silicon films

Li, J. F. / Sun, X. W. / Yu, M. B. / Qi, G. J. / Zeng, X. T.

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Nickel induced lateral crystallization behavior of amorphous silicon films

Contributors:

Li, J. F. (author) / Sun, X. W. (author) / Yu, M. B. (author) / Qi, G. J. (author) / Zeng, X. T. (author)

Published in:

APPLIED SURFACE SCIENCE ; 240 ; 155-160

Publication date:

2005-01-01

Size:

6 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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