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Dopant effect on in situ doped metal-induced lateral crystallization of amorphous silicon films

Hwang, J. D. / Chang, J. Y. / Wu, C. Y.

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Dopant effect on in situ doped metal-induced lateral crystallization of amorphous silicon films

Hwang, J. D. / Chang, J. Y. / Wu, C. Y.

Dopant effect on in situ doped metal-induced lateral crystallization of amorphous silicon films

Hwang, J. D. / Chang, J. Y. / Wu, C. Y.

Access

Access via TIB

Check availability in my library

Order at Subito €

Page navigation

Document information

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Document information

Title:

Dopant effect on in situ doped metal-induced lateral crystallization of amorphous silicon films

Contributors:

Hwang, J. D. (author) / Chang, J. Y. (author) / Wu, C. Y. (author)

Published in:

APPLIED SURFACE SCIENCE ; 249 ; 65-70

Publication date:

2005-01-01

Size:

6 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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