Improvement in epitaxial quality of selectively grown Si1-xGex layers with low pattern sensitivity for CMOS applications: Fid-Bau Portal

Improvement in epitaxial quality of selectively grown Si1-xGex layers with low pattern sensitivity for CMOS applications

Radamson, H. H. / Hallstedt, J. / Suvar, E. / Menon, C. / Ostling, M.

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Improvement in epitaxial quality of selectively grown Si1-xGex layers with low pattern sensitivity for CMOS applications

Radamson, H. H. / Hallstedt, J. / Suvar, E. / Menon, C. / Ostling, M.

Improvement in epitaxial quality of selectively grown Si1-xGex layers with low pattern sensitivity for CMOS applications

Radamson, H. H. / Hallstedt, J. / Suvar, E. / Menon, C. / Ostling, M.

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Check availability in my library

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Document information

Title:

Improvement in epitaxial quality of selectively grown Si1-xGex layers with low pattern sensitivity for CMOS applications

Contributors:

Radamson, H. H. (author) / Hallstedt, J. (author) / Suvar, E. (author) / Menon, C. (author) / Ostling, M. (author)

Published in:

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 8 ; 25-30

Publication date:

2005-01-01

Size:

6 pages

ISSN:

1369-8001

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.38152

Gfrorer, O. / Off, J. / Sohmer, A. et al. | British Library Online Contents | 1997

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Isheden, C. / Hellstrom, P. E. / von Haartman, M. et al. | British Library Online Contents | 2005

Epitaxial ErSi2-x on strained and relaxed Si1-xGex

Travlos, A. / Apostolopoulos, G. / Boukos, N. et al. | British Library Online Contents | 2002

Step-bunching and strain-effects in Si1-xGex layers and Superlattices grown on vicinal Si(001)

Muhlberger, M. / Schelling, C. / Springholz, G. et al. | British Library Online Contents | 2002

Technological aspects of epitaxial CoSi~2 layers for CMOS

Lauwers, A. / Schreutelkamp, R. J. / Brijs, B. et al. | British Library Online Contents | 1993