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Strained-silicon MOSFET process technology-control of impurity and germanium atoms at the hetero-interface
Strained-silicon MOSFET process technology-control of impurity and germanium atoms at the hetero-interface
Strained-silicon MOSFET process technology-control of impurity and germanium atoms at the hetero-interface
Sugii, N. (author) / Kimura, Y. (author) / Kimura, S. i. (author) / Irieda, S. (author) / Morioka, J. (author) / Inada, T. (author)
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 8 ; 89-95
2005-01-01
7 pages
Article (Journal)
English
DDC:
621.38152
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