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    Spectroscopic ellipsometry for in-line process control of SiGe:C HBT technology

    New search for: Fursenko, O.
    New search for: Bauer, J.
    New search for: Zaumseil, P.
    New search for: Kruger, D.
    New search for: Goryachko, A.
    New search for: Yamamoto, Y.
    New search for: Kopke, K.
    New search for: Tillack, B.

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    Spectroscopic ellipsometry for in-line process control of SiGe:C HBT technology

    New search for: Fursenko, O.
    New search for: Bauer, J.
    New search for: Zaumseil, P.
    New search for: Kruger, D.
    New search for: Goryachko, A.
    New search for: Yamamoto, Y.
    New search for: Kopke, K.
    New search for: Tillack, B.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Spectroscopic ellipsometry for in-line process control of SiGe:C HBT technology

    New search for: Fursenko, O.
    New search for: Bauer, J.
    New search for: Zaumseil, P.
    New search for: Kruger, D.
    New search for: Goryachko, A.
    New search for: Yamamoto, Y.
    New search for: Kopke, K.
    New search for: Tillack, B.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
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    Document information
    Title:

    Spectroscopic ellipsometry for in-line process control of SiGe:C HBT technology

    Contributors:

    Fursenko, O. (author) / Bauer, J. (author) / Zaumseil, P. (author) / Kruger, D. (author) / Goryachko, A. (author) / Yamamoto, Y. (author) / Kopke, K. (author) / Tillack, B. (author)

    Published in:

    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 8 ; 273-278

    Publication date:

    2005-01-01

    Size:

    6 pages

    ISSN:

    1369-8001

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.38152

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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