A platform for research: civil engineering, architecture and urbanism
A platform for research: civil engineering, architecture and urbanism
Process integration of infrared-sensitive PIN photodiodes and CMOS transistors in a single-SiGe substrate
Process integration of infrared-sensitive PIN photodiodes and CMOS transistors in a single-SiGe substrate
Process integration of infrared-sensitive PIN photodiodes and CMOS transistors in a single-SiGe substrate
Nebrich, L. (author) / Neumeier, K. (author) / Stadler, A. (author) / Weber, J. (author) / Bensch, F. (author) / Kreuzer, S. (author) / Vogg, G. (author) / Herrmann, K. (author) / Klumpp, A. (author) / Wieland, R. (author)
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 8 ; 429-433
2005-01-01
5 pages
Article (Journal)
English
DDC:
621.38152
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
| British Library Online Contents | 1999
Lateral scaling challenges for SiGe NPN BiCMOS process integration
| British Library Online Contents | 2005
Highly Sensitive Infrared Temperature Sensor for CMOS Compatible Thermopiles
| British Library Online Contents | 2006
Selective epitaxial growth of SiGe for strained Si transistors
| British Library Online Contents | 2006
Materials and technology issues for SiGe heterojunction bipolar transistors
| British Library Online Contents | 2001