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Lateral scaling challenges for SiGe NPN BiCMOS process integration

U'Ren, G. D.

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Lateral scaling challenges for SiGe NPN BiCMOS process integration

U'Ren, G. D.

Lateral scaling challenges for SiGe NPN BiCMOS process integration

U'Ren, G. D.

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Access via TIB

Check availability in my library

Order at Subito €

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Document information

Title:

Lateral scaling challenges for SiGe NPN BiCMOS process integration

Contributors:

U'Ren, G. D. (author)

Published in:

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 8 ; 313-317

Publication date:

2005-01-01

Size:

5 pages

ISSN:

1369-8001

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.38152

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