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Modelling plasma etching of Al thin films using neural network

Kim, B. / Park, K. Y. / Han, D.

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Modelling plasma etching of Al thin films using neural network

Kim, B. / Park, K. Y. / Han, D.

Modelling plasma etching of Al thin films using neural network

Kim, B. / Park, K. Y. / Han, D.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Modelling plasma etching of Al thin films using neural network

Contributors:

Kim, B. (author) / Park, K. Y. (author) / Han, D. (author)

Published in:

SURFACE ENGINEERING -LONDON- ; 20 ; 454-458

Publication date:

2004-01-01

Size:

5 pages

ISSN:

0267-0844

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.44

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