A platform for research: civil engineering, architecture and urbanism
Characterization of Aluminum and Titanium Oxides Deposited on 4H-SiC by Atomic Layer Deposition Technique
Characterization of Aluminum and Titanium Oxides Deposited on 4H-SiC by Atomic Layer Deposition Technique
Characterization of Aluminum and Titanium Oxides Deposited on 4H-SiC by Atomic Layer Deposition Technique
Wolborski, M. (author) / Bakowski, M. (author) / Pore, V. (author) / Ritala, M. (author) / Leskela, M. (author) / Schoner, A. (author) / Hallen, A. (author) / Nipoti, R. / Poggi, A. / Scorzoni, A.
2005-01-01
4 pages
Article (Journal)
English
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Atomic layer deposition of ZnO transparent conducting oxides
British Library Online Contents | 1997
|Passivation of GaAs surface by atomic-layer-deposited titanium nitride
British Library Online Contents | 2008
|British Library Online Contents | 2000
|British Library Online Contents | 2016
|EROSION RESISTANT METAL OXIDE COATINGS DEPOSITED BY ATOMIC LAYER DEPOSITION
European Patent Office | 2023
|