Study of hydrogenated nanoamorphous silicon(na-Si:H) thin film prepared by RF magnetron sputtering for graded optical band gap (Eoptg): Fid-Bau Portal

Study of hydrogenated nanoamorphous silicon(na-Si:H) thin film prepared by RF magnetron sputtering for graded optical band gap (Eoptg)

Yu, H. / Cui, R. / Wang, H. / Yang, H. / Zhao, B. / Zhao, Z. / Tang, D. / Lin, S. / Meng, F.

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Study of hydrogenated nanoamorphous silicon(na-Si:H) thin film prepared by RF magnetron sputtering for graded optical band gap (Eoptg)

Yu, H. / Cui, R. / Wang, H. / Yang, H. / Zhao, B. / Zhao, Z. / Tang, D. / Lin, S. / Meng, F.

Study of hydrogenated nanoamorphous silicon(na-Si:H) thin film prepared by RF magnetron sputtering for graded optical band gap (Eoptg)

Yu, H. / Cui, R. / Wang, H. / Yang, H. / Zhao, B. / Zhao, Z. / Tang, D. / Lin, S. / Meng, F.

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Document information

Title:

Study of hydrogenated nanoamorphous silicon(na-Si:H) thin film prepared by RF magnetron sputtering for graded optical band gap (Eoptg)

Contributors:

Yu, H. (author) / Cui, R. (author) / Wang, H. (author) / Yang, H. (author) / Zhao, B. (author) / Zhao, Z. (author) / Tang, D. (author) / Lin, S. (author) / Meng, F. (author)

Published in:

JOURNAL OF MATERIALS SCIENCE ; 40 ; 1367-1370

Publication date:

2005-01-01

Size:

4 pages

ISSN:

0022-2461

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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