Atomic layer deposition rate, phase composition and performance of HfO2 films on noble metal and alkoxylated silicon substrates: Fid-Bau Portal

Atomic layer deposition rate, phase composition and performance of HfO2 films on noble metal and alkoxylated silicon substrates

Kukli, K. / Ritala, M. / Pilvi, T. / Aaltonen, T. / Aarik, J. / Lautala, M. / Leskela, M.

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Atomic layer deposition rate, phase composition and performance of HfO2 films on noble metal and alkoxylated silicon substrates

Kukli, K. / Ritala, M. / Pilvi, T. / Aaltonen, T. / Aarik, J. / Lautala, M. / Leskela, M.

Atomic layer deposition rate, phase composition and performance of HfO2 films on noble metal and alkoxylated silicon substrates

Kukli, K. / Ritala, M. / Pilvi, T. / Aaltonen, T. / Aarik, J. / Lautala, M. / Leskela, M.

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Check availability in my library

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Document information

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Document information

Title:

Atomic layer deposition rate, phase composition and performance of HfO2 films on noble metal and alkoxylated silicon substrates

Contributors:

Kukli, K. (author) / Ritala, M. (author) / Pilvi, T. (author) / Aaltonen, T. (author) / Aarik, J. (author) / Lautala, M. (author) / Leskela, M. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 118 ; 112-116

Publication date:

2005-01-01

Size:

5 pages

ISSN:

0921-5107

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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