Atomic layer deposition of HfO2: Effect of structure development on growth rate, morphology and optical properties of thin films: Fid-Bau Portal

Atomic layer deposition of HfO2: Effect of structure development on growth rate, morphology and optical properties of thin films

Rammula, R. / Aarik, J. / Mandar, H. / Ritslaid, P. / Sammelselg, V.

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Atomic layer deposition of HfO2: Effect of structure development on growth rate, morphology and optical properties of thin films

Rammula, R. / Aarik, J. / Mandar, H. / Ritslaid, P. / Sammelselg, V.

Atomic layer deposition of HfO2: Effect of structure development on growth rate, morphology and optical properties of thin films

Rammula, R. / Aarik, J. / Mandar, H. / Ritslaid, P. / Sammelselg, V.

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Check availability in my library

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Document information

Title:

Atomic layer deposition of HfO2: Effect of structure development on growth rate, morphology and optical properties of thin films

Contributors:

Rammula, R. (author) / Aarik, J. (author) / Mandar, H. (author) / Ritslaid, P. (author) / Sammelselg, V. (author)

Published in:

APPLIED SURFACE SCIENCE ; 257 ; 1043-1052

Publication date:

2010-01-01

Size:

10 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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