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    Silicon surface passivation using thin HfO2 films by atomic layer deposition

    New search for: Gope, J.
    New search for: Batra, N.
    New search for: Panigrahi, J.
    New search for: Singh, R.
    New search for: Maurya, K. K.
    New search for: Srivastava, R.
    New search for: Singh, P. K.

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    Silicon surface passivation using thin HfO2 films by atomic layer deposition

    New search for: Gope, J.
    New search for: Batra, N.
    New search for: Panigrahi, J.
    New search for: Singh, R.
    New search for: Maurya, K. K.
    New search for: Srivastava, R.
    New search for: Singh, P. K.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Silicon surface passivation using thin HfO2 films by atomic layer deposition

    New search for: Gope, J.
    New search for: Batra, N.
    New search for: Panigrahi, J.
    New search for: Singh, R.
    New search for: Maurya, K. K.
    New search for: Srivastava, R.
    New search for: Singh, P. K.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
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    Document information
    Title:

    Silicon surface passivation using thin HfO2 films by atomic layer deposition

    Contributors:

    Gope, J. (author) / Batra, N. (author) / Panigrahi, J. (author) / Singh, R. (author) / Maurya, K. K. (author) / Srivastava, R. (author) / Singh, P. K. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 357 ; 635-642

    Publication date:

    2015-01-01

    Size:

    8 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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