Preparation of molybdenum-doped indium oxide thin films using reactive direct-current magnetron sputtering: Fid-Bau Portal

Preparation of molybdenum-doped indium oxide thin films using reactive direct-current magnetron sputtering

Li, X. / Miao, W. / Zhang, Q. / Huang, L. / Zhang, Z. / Hua, Z.

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Preparation of molybdenum-doped indium oxide thin films using reactive direct-current magnetron sputtering

Li, X. / Miao, W. / Zhang, Q. / Huang, L. / Zhang, Z. / Hua, Z.

Preparation of molybdenum-doped indium oxide thin films using reactive direct-current magnetron sputtering

Li, X. / Miao, W. / Zhang, Q. / Huang, L. / Zhang, Z. / Hua, Z.

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Check availability in my library

Order at Subito €

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Document information

Title:

Preparation of molybdenum-doped indium oxide thin films using reactive direct-current magnetron sputtering

Contributors:

Li, X. (author) / Miao, W. (author) / Zhang, Q. (author) / Huang, L. (author) / Zhang, Z. (author) / Hua, Z. (author)

Published in:

JOURNAL OF MATERIALS RESEARCH -PITTSBURGH THEN WARRENDALE- ; 20 ; 1404-1408

Publication date:

2005-01-01

Size:

5 pages

ISSN:

0884-2914

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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