Solid-phase crystallization and dopant activation of amorphous silicon films by pulsed rapid thermal annealing: Fid-Bau Portal

Solid-phase crystallization and dopant activation of amorphous silicon films by pulsed rapid thermal annealing

Wang, Y. / Liao, X. / Ma, Z. / Yue, G. / Diao, H. / He, J. / Kong, G. / Zhao, Y. / Li, Z. / Yun, F.

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Solid-phase crystallization and dopant activation of amorphous silicon films by pulsed rapid thermal annealing

Wang, Y. / Liao, X. / Ma, Z. / Yue, G. / Diao, H. / He, J. / Kong, G. / Zhao, Y. / Li, Z. / Yun, F.

Solid-phase crystallization and dopant activation of amorphous silicon films by pulsed rapid thermal annealing

Wang, Y. / Liao, X. / Ma, Z. / Yue, G. / Diao, H. / He, J. / Kong, G. / Zhao, Y. / Li, Z. / Yun, F.

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Document information

Title:

Solid-phase crystallization and dopant activation of amorphous silicon films by pulsed rapid thermal annealing

Contributors:

Wang, Y. (author) / Liao, X. (author) / Ma, Z. (author) / Yue, G. (author) / Diao, H. (author) / He, J. (author) / Kong, G. (author) / Zhao, Y. (author) / Li, Z. (author) / Yun, F. (author)

Published in:

APPLIED SURFACE SCIENCE ; 135 ; 205-208

Publication date:

1998-01-01

Size:

4 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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