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    Nanoindentation analysis of mechanical properties of low to ultralow dielectric constant SiCOH films

    New search for: Wang, L.
    New search for: Ganor, M.
    New search for: Rokhlin, S. I.
    New search for: Grill, A.

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    Nanoindentation analysis of mechanical properties of low to ultralow dielectric constant SiCOH films

    New search for: Wang, L.
    New search for: Ganor, M.
    New search for: Rokhlin, S. I.
    New search for: Grill, A.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Nanoindentation analysis of mechanical properties of low to ultralow dielectric constant SiCOH films

    New search for: Wang, L.
    New search for: Ganor, M.
    New search for: Rokhlin, S. I.
    New search for: Grill, A.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Nanoindentation analysis of mechanical properties of low to ultralow dielectric constant SiCOH films

    Contributors:

    Wang, L. (author) / Ganor, M. (author) / Rokhlin, S. I. (author) / Grill, A. (author)

    Published in:

    JOURNAL OF MATERIALS RESEARCH -PITTSBURGH THEN WARRENDALE- ; 20 ; 2080-2093

    Publication date:

    2005-01-01

    Size:

    14 pages

    ISSN:

    0884-2914

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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