Effects of He (90%)/H2 (10%) plasma treatment on electric properties of low dielectric constant SiCOH films: Fid-Bau Portal

Effects of He (90%)/H2 (10%) plasma treatment on electric properties of low dielectric constant SiCOH films

Kim, H. / Ha, M.H. / Jung, D. / Chae, H.

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Effects of He (90%)/H2 (10%) plasma treatment on electric properties of low dielectric constant SiCOH films

Kim, H. / Ha, M.H. / Jung, D. / Chae, H.

Effects of He (90%)/H2 (10%) plasma treatment on electric properties of low dielectric constant SiCOH films

Kim, H. / Ha, M.H. / Jung, D. / Chae, H.

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Effects of He (90%)/H2 (10%) plasma treatment on electric properties of low dielectric constant SiCOH films

Contributors:

Kim, H. (author) / Ha, M.H. (author) / Jung, D. (author) / Chae, H. (author) / Boo, J.-H. / Ahn, H.

Published in:

Proceedings of the IFFM2011 (2011 International Forum on Functional Materials) and AFM-2 (2nd Special Symposium on Advances in Functional Materials) Jeju island, Korea 28-31 July 2011 ; 3008-3010

MATERIALS RESEARCH BULLETIN ; 47

Publication date:

2012-01-01

Size:

3 pages

ISSN:

0025-5408

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11 / 620

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