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    Characterization and process effects of HfO2 thin films grown by metal-organic molecular beam epitaxy

    New search for: Kim, M. S.
    New search for: Ko, Y. D.
    New search for: Yun, M.
    New search for: Hong, J. H.
    New search for: Jeong, M. C.
    New search for: Myoung, J. M.
    New search for: Yun, I.

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    Characterization and process effects of HfO2 thin films grown by metal-organic molecular beam epitaxy

    New search for: Kim, M. S.
    New search for: Ko, Y. D.
    New search for: Yun, M.
    New search for: Hong, J. H.
    New search for: Jeong, M. C.
    New search for: Myoung, J. M.
    New search for: Yun, I.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Characterization and process effects of HfO2 thin films grown by metal-organic molecular beam epitaxy

    New search for: Kim, M. S.
    New search for: Ko, Y. D.
    New search for: Yun, M.
    New search for: Hong, J. H.
    New search for: Jeong, M. C.
    New search for: Myoung, J. M.
    New search for: Yun, I.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
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    Document information
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    Document information
    Title:

    Characterization and process effects of HfO2 thin films grown by metal-organic molecular beam epitaxy

    Contributors:

    Kim, M. S. (author) / Ko, Y. D. (author) / Yun, M. (author) / Hong, J. H. (author) / Jeong, M. C. (author) / Myoung, J. M. (author) / Yun, I. (author)

    Published in:

    MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 123 ; 20-30

    Publication date:

    2005-01-01

    Size:

    11 pages

    ISSN:

    0921-5107

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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