Understanding the role of buried Si/SiO2 interface on dopant and defect evolution in PAI USJ: Fid-Bau Portal

Understanding the role of buried Si/SiO2 interface on dopant and defect evolution in PAI USJ

Hamilton, J. J. / Collart, E. J. / Colombeau, B. / Bersani, M. / Giubertoni, D. / Sharp, J. A. / Cowern, N. E. / Kirkby, K. J.

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Understanding the role of buried Si/SiO2 interface on dopant and defect evolution in PAI USJ

Hamilton, J. J. / Collart, E. J. / Colombeau, B. / Bersani, M. / Giubertoni, D. / Sharp, J. A. / Cowern, N. E. / Kirkby, K. J.

Understanding the role of buried Si/SiO2 interface on dopant and defect evolution in PAI USJ

Hamilton, J. J. / Collart, E. J. / Colombeau, B. / Bersani, M. / Giubertoni, D. / Sharp, J. A. / Cowern, N. E. / Kirkby, K. J.

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Title:

Understanding the role of buried Si/SiO2 interface on dopant and defect evolution in PAI USJ

Contributors:

Hamilton, J. J. (author) / Collart, E. J. (author) / Colombeau, B. (author) / Bersani, M. (author) / Giubertoni, D. (author) / Sharp, J. A. (author) / Cowern, N. E. (author) / Kirkby, K. J. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 124-125 ; 215-218

Publication date:

2005-01-01

Size:

4 pages

ISSN:

0921-5107

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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