Modeling of the transient enhanced diffusion of boron implanted into preamorphized silicon: the case of BF2+ implantation: Fid-Bau Portal

Modeling of the transient enhanced diffusion of boron implanted into preamorphized silicon: the case of BF2+ implantation

Dusch, A. / Marcon, J. / Masmoudi, K. / Olivie, F. / Benzohra, M. / Ketata, K. / Ketata, M.

Access

Access via TIB

Check availability in my library

Order at Subito €

Page navigation

Document information

Similar titles

Export, share and cite

Modeling of the transient enhanced diffusion of boron implanted into preamorphized silicon: the case of BF2+ implantation

Dusch, A. / Marcon, J. / Masmoudi, K. / Olivie, F. / Benzohra, M. / Ketata, K. / Ketata, M.

Modeling of the transient enhanced diffusion of boron implanted into preamorphized silicon: the case of BF2+ implantation

Dusch, A. / Marcon, J. / Masmoudi, K. / Olivie, F. / Benzohra, M. / Ketata, K. / Ketata, M.

Access

Access via TIB

Check availability in my library

Order at Subito €

Page navigation

Document information

Similar titles

Export, share and cite

Document information

Title:

Modeling of the transient enhanced diffusion of boron implanted into preamorphized silicon: the case of BF2+ implantation

Contributors:

Dusch, A. (author) / Marcon, J. (author) / Masmoudi, K. (author) / Olivie, F. (author) / Benzohra, M. (author) / Ketata, K. (author) / Ketata, M. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 80 ; 65 - 67

Publication date:

2001-01-01

Size:

3 pages

ISSN:

0921-5107

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

El Mubarek, H. A. / Wang, Y. / Price, R. et al. | British Library Online Contents | 2005

An investigation on the modeling of boron-enhanced diffusion of ultralow energy implanted boron in silicon

Marcon, J. / Ihaddadene-Le Coq, L. / Masmoudi, K. et al. | British Library Online Contents | 2005

Recrystallization of boron-doped and undoped preamorphized silicon layers by rapid and conventional thermal annealing

Faure, J. / Claverie, A. / Laanab, L. et al. | British Library Online Contents | 1994

Diffusion of ion-implanted boron impurities into pre-amorphized silicon

Ohno, N. / Hara, T. / Matsunaga, Y. et al. | British Library Online Contents | 2000

Evolution of boron-interstitial clusters in preamorphized silicon without the contribution of end-of-range defects

Aboy, M. / Pelaz, L. / Lopez, P. et al. | British Library Online Contents | 2008