Effect of Ni interlayer on stress level of CoSi2 films in Co/Ni/Si(100) bi-layered system: Fid-Bau Portal

Effect of Ni interlayer on stress level of CoSi2 films in Co/Ni/Si(100) bi-layered system

Ma, K. / Feng, J. Y.

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Effect of Ni interlayer on stress level of CoSi2 films in Co/Ni/Si(100) bi-layered system

Ma, K. / Feng, J. Y.

Effect of Ni interlayer on stress level of CoSi2 films in Co/Ni/Si(100) bi-layered system

Ma, K. / Feng, J. Y.

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Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Effect of Ni interlayer on stress level of CoSi2 films in Co/Ni/Si(100) bi-layered system

Contributors:

Ma, K. (author) / Feng, J. Y. (author)

Published in:

APPLIED SURFACE SCIENCE ; 252 ; 1679-1684

Publication date:

2005-01-01

Size:

6 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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