Deep reactive ion etching and focused ion beam combination for nanotip fabrication: Fid-Bau Portal

Deep reactive ion etching and focused ion beam combination for nanotip fabrication

Villanueva, G. / Plaza, J. A. / Sánchez-Amores, A. / Bausells, J. / Martínez, E. / Samitier, J. / Errachid, A.

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Deep reactive ion etching and focused ion beam combination for nanotip fabrication

Villanueva, G. / Plaza, J. A. / Sánchez-Amores, A. / Bausells, J. / Martínez, E. / Samitier, J. / Errachid, A.

Deep reactive ion etching and focused ion beam combination for nanotip fabrication

Villanueva, G. / Plaza, J. A. / Sánchez-Amores, A. / Bausells, J. / Martínez, E. / Samitier, J. / Errachid, A.

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Document information

Title:

Deep reactive ion etching and focused ion beam combination for nanotip fabrication

Contributors:

Villanueva, G. (author) / Plaza, J. A. (author) / Sánchez-Amores, A. (author) / Bausells, J. (author) / Martínez, E. (author) / Samitier, J. (author) / Errachid, A. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING -AMSTERDAM THEN LAUSANNE- C ; 26 ; 164-168

Publication date:

2006-01-01

Size:

5 pages

ISSN:

0928-4931

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.1 / 660

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