Delineation of Flow Pattern Defects in Heavily Boron-doped Czochralski Silicon Wafer: Fid-Bau Portal

Delineation of Flow Pattern Defects in Heavily Boron-doped Czochralski Silicon Wafer

Fang, M. / Yang, D.-r. / Ma, X.-y. / Que, D.-l.

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Delineation of Flow Pattern Defects in Heavily Boron-doped Czochralski Silicon Wafer

Fang, M. / Yang, D.-r. / Ma, X.-y. / Que, D.-l.

Delineation of Flow Pattern Defects in Heavily Boron-doped Czochralski Silicon Wafer

Fang, M. / Yang, D.-r. / Ma, X.-y. / Que, D.-l.

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Document information

Title:

Delineation of Flow Pattern Defects in Heavily Boron-doped Czochralski Silicon Wafer

Contributors:

Fang, M. (author) / Yang, D.-r. (author) / Ma, X.-y. (author) / Que, D.-l. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING -HANGZHOU- ; 24 ; 212-214

Publication date:

2006-01-01

Size:

3 pages

ISSN:

1004-793X

Type of media:

Article (Journal)

Type of material:

Language:

Unknown

Classification:

DDC: 620.11

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