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    Chemical reaction of sputtered Cu film with PI modified by low energy reactive atomic beam

    New search for: Park, J. Y.
    New search for: Jung, Y. S.
    New search for: Cho, J.
    New search for: Choi, W. K.

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    Chemical reaction of sputtered Cu film with PI modified by low energy reactive atomic beam

    New search for: Park, J. Y.
    New search for: Jung, Y. S.
    New search for: Cho, J.
    New search for: Choi, W. K.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Chemical reaction of sputtered Cu film with PI modified by low energy reactive atomic beam

    New search for: Park, J. Y.
    New search for: Jung, Y. S.
    New search for: Cho, J.
    New search for: Choi, W. K.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Chemical reaction of sputtered Cu film with PI modified by low energy reactive atomic beam

    Contributors:

    Park, J. Y. (author) / Jung, Y. S. (author) / Cho, J. (author) / Choi, W. K. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 252 ; 5877-5891

    Publication date:

    2006-01-01

    Size:

    15 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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