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DNA as an Electron-Beam-Sensitive Reagent for Nanopatterning

Lin, H. Y. / Tsai, L. C. / Chi, P. Y. / Chen, C. D.

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DNA as an Electron-Beam-Sensitive Reagent for Nanopatterning

Lin, H. Y. / Tsai, L. C. / Chi, P. Y. / Chen, C. D.

DNA as an Electron-Beam-Sensitive Reagent for Nanopatterning

Lin, H. Y. / Tsai, L. C. / Chi, P. Y. / Chen, C. D.

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Document information

Title:

DNA as an Electron-Beam-Sensitive Reagent for Nanopatterning

Contributors:

Lin, H. Y. (author) / Tsai, L. C. (author) / Chi, P. Y. (author) / Chen, C. D. (author)

Published in:

ADVANCED MATERIALS -DEERFIELD BEACH THEN WEINHEIM- ; 18 ; 1517-1520

Publication date:

2006-01-01

Size:

4 pages

ISSN:

0935-9648

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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