Effect on Crystal Orientation on Residual Stress and Electrical Properties of a PZT Thin Film Deposited on Buffered-Si Substrate: Fid-Bau Portal

Effect on Crystal Orientation on Residual Stress and Electrical Properties of a PZT Thin Film Deposited on Buffered-Si Substrate

Fujito, K. / Wakiya, N. / Kiguchi, T. / Mizutani, N. / Shinozaki, K.

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Effect on Crystal Orientation on Residual Stress and Electrical Properties of a PZT Thin Film Deposited on Buffered-Si Substrate

Fujito, K. / Wakiya, N. / Kiguchi, T. / Mizutani, N. / Shinozaki, K.

Effect on Crystal Orientation on Residual Stress and Electrical Properties of a PZT Thin Film Deposited on Buffered-Si Substrate

Fujito, K. / Wakiya, N. / Kiguchi, T. / Mizutani, N. / Shinozaki, K.

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Document information

Title:

Effect on Crystal Orientation on Residual Stress and Electrical Properties of a PZT Thin Film Deposited on Buffered-Si Substrate

Contributors:

Fujito, K. (author) / Wakiya, N. (author) / Kiguchi, T. (author) / Mizutani, N. (author) / Shinozaki, K. (author)

Published in:

KEY ENGINEERING MATERIALS ; 320 ; 65-68

Publication date:

2006-01-01

Size:

4 pages

ISSN:

1013-9826

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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