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Nitrogen-doped Czochralski silicon treated in rapid thermal process

Yang, D. / Li, M. / Cui, C. / Ma, X. / Que, D.

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Nitrogen-doped Czochralski silicon treated in rapid thermal process

Yang, D. / Li, M. / Cui, C. / Ma, X. / Que, D.

Nitrogen-doped Czochralski silicon treated in rapid thermal process

Yang, D. / Li, M. / Cui, C. / Ma, X. / Que, D.

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Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Nitrogen-doped Czochralski silicon treated in rapid thermal process

Contributors:

Yang, D. (author) / Li, M. (author) / Cui, C. (author) / Ma, X. (author) / Que, D. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 134 ; 193-201

Publication date:

2006-01-01

Size:

9 pages

ISSN:

0921-5107

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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Isoelectronic Bound-Multiexciton Systems in Thermally-Treated Czochralski Silicon

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