Recombination activity of nickel in nitrogen-doped Czochralski silicon treated by rapid thermal processing: Fid-Bau Portal

Recombination activity of nickel in nitrogen-doped Czochralski silicon treated by rapid thermal processing

Wang, W. / Yang, D. / Ma, X. / Zeng, Y. / Que, D.

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Recombination activity of nickel in nitrogen-doped Czochralski silicon treated by rapid thermal processing

Wang, W. / Yang, D. / Ma, X. / Zeng, Y. / Que, D.

Recombination activity of nickel in nitrogen-doped Czochralski silicon treated by rapid thermal processing

Wang, W. / Yang, D. / Ma, X. / Zeng, Y. / Que, D.

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Check availability in my library

Order at Subito €

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Document information

Title:

Recombination activity of nickel in nitrogen-doped Czochralski silicon treated by rapid thermal processing

Contributors:

Wang, W. (author) / Yang, D. (author) / Ma, X. (author) / Zeng, Y. (author) / Que, D. (author)

Published in:

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 10 ; 222-226

Publication date:

2007-01-01

Size:

5 pages

ISSN:

1369-8001

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.38152

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