A platform for research: civil engineering, architecture and urbanism
Recombination activity of nickel in Czochralski silicon during rapid thermal process
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 9 ; 296-299
2006-01-01
4 pages
Article (Journal)
English
DDC:
621.38152
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
British Library Online Contents | 2007
|Nitrogen-doped Czochralski silicon treated in rapid thermal process
British Library Online Contents | 2006
|Precipitate recognition and recombination strength in annealed Czochralski silicon wafers
British Library Online Contents | 1995
|Oxygen transportation during Czochralski silicon crystal growth
British Library Online Contents | 2000
|Intentional thermal donor activation in magnetic Czochralski silicon
British Library Online Contents | 2007
|