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Recombination activity of nickel in Czochralski silicon during rapid thermal process

Wang, W. / Xi, Z. / Yang, D. / Que, D.

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Recombination activity of nickel in Czochralski silicon during rapid thermal process

Wang, W. / Xi, Z. / Yang, D. / Que, D.

Recombination activity of nickel in Czochralski silicon during rapid thermal process

Wang, W. / Xi, Z. / Yang, D. / Que, D.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Recombination activity of nickel in Czochralski silicon during rapid thermal process

Contributors:

Wang, W. (author) / Xi, Z. (author) / Yang, D. (author) / Que, D. (author)

Published in:

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 9 ; 296-299

Publication date:

2006-01-01

Size:

4 pages

ISSN:

1369-8001

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.38152

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