Fachinformationsdienst BAUdigital

A platform for research: civil engineering, architecture and urbanism

    Surface phenomena related to mirror degradation in extreme ultraviolet (EUV) lithography

    New search for: Madey, T. E.
    New search for: Faradzhev, N. S.
    New search for: Yakshinskiy, B. V.
    New search for: Edwards, N. V.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Surface phenomena related to mirror degradation in extreme ultraviolet (EUV) lithography

    New search for: Madey, T. E.
    New search for: Faradzhev, N. S.
    New search for: Yakshinskiy, B. V.
    New search for: Edwards, N. V.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Surface phenomena related to mirror degradation in extreme ultraviolet (EUV) lithography

    New search for: Madey, T. E.
    New search for: Faradzhev, N. S.
    New search for: Yakshinskiy, B. V.
    New search for: Edwards, N. V.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Surface phenomena related to mirror degradation in extreme ultraviolet (EUV) lithography

    Contributors:

    Madey, T. E. (author) / Faradzhev, N. S. (author) / Yakshinskiy, B. V. (author) / Edwards, N. V. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 253 ; 1691-1708

    Publication date:

    2006-01-01

    Size:

    18 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

    Similar titles

    Study on contamination of projection optics surface for extreme ultraviolet lithography

    Koida, K. / Niibe, M. | British Library Online Contents | 2009

    Patterning at the nanoscale: Atomic force microscopy and extreme ultraviolet interference lithography

    Parisse, P. / Luciani, D. / D'Angelo, A. et al. | British Library Online Contents | 2009

    Effect of post-etch cleaning on Ru-capped extreme ultraviolet lithography photomask

    Oh, J. / Park, C. / Seo, D. et al. | British Library Online Contents | 2012

    Mitigation of ion and particulate emission from laser-produced plasmas used for extreme ultraviolet lithography

    Di Lazzaro, P. / Bollanti, S. / Flora, F. et al. | British Library Online Contents | 2013

    Extreme UV lithography to power electronics

    British Library Online Contents | 2008

    Back to top