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    Effect of post-etch cleaning on Ru-capped extreme ultraviolet lithography photomask

    New search for: Oh, J.
    New search for: Park, C.
    New search for: Seo, D.
    New search for: Jung, J.
    New search for: Lim, S.

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    Effect of post-etch cleaning on Ru-capped extreme ultraviolet lithography photomask

    New search for: Oh, J.
    New search for: Park, C.
    New search for: Seo, D.
    New search for: Jung, J.
    New search for: Lim, S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Effect of post-etch cleaning on Ru-capped extreme ultraviolet lithography photomask

    New search for: Oh, J.
    New search for: Park, C.
    New search for: Seo, D.
    New search for: Jung, J.
    New search for: Lim, S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Effect of post-etch cleaning on Ru-capped extreme ultraviolet lithography photomask

    Contributors:

    Oh, J. (author) / Park, C. (author) / Seo, D. (author) / Jung, J. (author) / Lim, S. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 258 ; 4702-4706

    Publication date:

    2012-01-01

    Size:

    5 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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