High-density plasma etching of indium-zinc oxide films in Ar/Cl2 and Ar/CH4/H2 chemistries: Fid-Bau Portal

High-density plasma etching of indium-zinc oxide films in Ar/Cl2 and Ar/CH4/H2 chemistries

Lim, W. T. / Stafford, L. / Song, J. I. / Park, J. S. / Heo, Y. W. / Lee, J. H. / Kim, J. J. / Pearton, S. J.

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High-density plasma etching of indium-zinc oxide films in Ar/Cl2 and Ar/CH4/H2 chemistries

Lim, W. T. / Stafford, L. / Song, J. I. / Park, J. S. / Heo, Y. W. / Lee, J. H. / Kim, J. J. / Pearton, S. J.

High-density plasma etching of indium-zinc oxide films in Ar/Cl2 and Ar/CH4/H2 chemistries

Lim, W. T. / Stafford, L. / Song, J. I. / Park, J. S. / Heo, Y. W. / Lee, J. H. / Kim, J. J. / Pearton, S. J.

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Document information

Title:

High-density plasma etching of indium-zinc oxide films in Ar/Cl2 and Ar/CH4/H2 chemistries

Contributors:

Lim, W. T. (author) / Stafford, L. (author) / Song, J. I. (author) / Park, J. S. (author) / Heo, Y. W. (author) / Lee, J. H. (author) / Kim, J. J. (author) / Pearton, S. J. (author)

Published in:

APPLIED SURFACE SCIENCE ; 253 ; 2752-2757

Publication date:

2006-01-01

Size:

6 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

Lim, W. T. / Stafford, L. / Song, J. I. et al. | British Library Online Contents | 2007

Comparison of plasma chemistries for the dry etching of bulk single-crystal zinc-oxide and rf-sputtered indium-zinc-oxide films

Lim, W. T. / Stafford, L. / Wright, J. S. et al. | British Library Online Contents | 2007

New gas chemistries for high-performance and chargeless dielectric etching

Samukawa, S. / Mukai, T. / Noguchi, K. | British Library Online Contents | 1999

Etching of Transparent and Conductive Indium Tin Oxide Films

Zhai, L. / Zhou, H. / Li, X. et al. | British Library Online Contents | 2014

Dry etching of bulk single-crystal ZnO in CH4/H2-based plasma chemistries

Lim, W. / Voss, L. / Khanna, R. et al. | British Library Online Contents | 2006