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Comparison of plasma chemistries for the dry etching of bulk single-crystal zinc-oxide and rf-sputtered indium-zinc-oxide films
Comparison of plasma chemistries for the dry etching of bulk single-crystal zinc-oxide and rf-sputtered indium-zinc-oxide films
Comparison of plasma chemistries for the dry etching of bulk single-crystal zinc-oxide and rf-sputtered indium-zinc-oxide films
Lim, W. T. (author) / Stafford, L. (author) / Wright, J. S. (author) / Vossa, L. F. (author) / Khanna, R. (author) / Song, J. I. (author) / Park, J. S. (author) / Heo, Y. W. (author) / Lee, J. H. (author) / Kim, J. J. (author)
APPLIED SURFACE SCIENCE ; 253 ; 9228-9233
2007-01-01
6 pages
Article (Journal)
English
DDC:
621.35
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