Dry etching of bulk single-crystal ZnO in CH4/H2-based plasma chemistries: Fid-Bau Portal

Dry etching of bulk single-crystal ZnO in CH4/H2-based plasma chemistries

Lim, W. / Voss, L. / Khanna, R. / Gila, B. P. / Norton, D. P. / Pearton, S. J. / Ren, F.

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Dry etching of bulk single-crystal ZnO in CH4/H2-based plasma chemistries

Lim, W. / Voss, L. / Khanna, R. / Gila, B. P. / Norton, D. P. / Pearton, S. J. / Ren, F.

Dry etching of bulk single-crystal ZnO in CH4/H2-based plasma chemistries

Lim, W. / Voss, L. / Khanna, R. / Gila, B. P. / Norton, D. P. / Pearton, S. J. / Ren, F.

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Dry etching of bulk single-crystal ZnO in CH4/H2-based plasma chemistries

Contributors:

Lim, W. (author) / Voss, L. (author) / Khanna, R. (author) / Gila, B. P. (author) / Norton, D. P. (author) / Pearton, S. J. (author) / Ren, F. (author)

Published in:

APPLIED SURFACE SCIENCE ; 253 ; 889-894

Publication date:

2006-01-01

Size:

6 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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