Fachinformationsdienst BAUdigital

A platform for research: civil engineering, architecture and urbanism

    Influence of nitrogen flow rate on growth of TiAlN films prepared by DC magnetron sputtering

    New search for: Irudayaraj, A. A.
    New search for: Kuppusami, P.
    New search for: Thirumurugesan, R.
    New search for: Mohandas, E.
    New search for: Kalainathan, S.
    New search for: Raghunathan, V. S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Influence of nitrogen flow rate on growth of TiAlN films prepared by DC magnetron sputtering

    New search for: Irudayaraj, A. A.
    New search for: Kuppusami, P.
    New search for: Thirumurugesan, R.
    New search for: Mohandas, E.
    New search for: Kalainathan, S.
    New search for: Raghunathan, V. S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Influence of nitrogen flow rate on growth of TiAlN films prepared by DC magnetron sputtering

    New search for: Irudayaraj, A. A.
    New search for: Kuppusami, P.
    New search for: Thirumurugesan, R.
    New search for: Mohandas, E.
    New search for: Kalainathan, S.
    New search for: Raghunathan, V. S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Influence of nitrogen flow rate on growth of TiAlN films prepared by DC magnetron sputtering

    Contributors:

    Irudayaraj, A. A. (author) / Kuppusami, P. (author) / Thirumurugesan, R. (author) / Mohandas, E. (author) / Kalainathan, S. (author) / Raghunathan, V. S. (author)

    Published in:

    SURFACE ENGINEERING -LONDON- ; 23 ; 7-11

    Publication date:

    2007-01-01

    Size:

    5 pages

    ISSN:

    0267-0844

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.44

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

    Similar titles

    Structure and mechanical properties of Zr/TiAlN films prepared by plasma-enhanced magnetron sputtering

    Xian, G. / Zhao, H. B. / Fan, H. Y. et al. | British Library Online Contents | 2015

    Microstructure and Properties of TiAlN Compound Films Fabricated on AZ91D Alloy by Magnetron Sputtering

    Lu, S. / Wu, L.W. / Chen, J. | British Library Online Contents | 2011

    TiAlN coatings deposited by triode magnetron sputtering varying the bias voltage

    Devia, D. M. / Restrepo-Parra, E. / Arango, P. J. et al. | British Library Online Contents | 2011

    Formation of nanostructured TiAlN, TiCrN, and TiSiN coatings using reactive magnetron sputtering

    Komarov, F. F. / Konstantinov, S. V. / Pilko, V. V. | British Library Online Contents | 2014

    Influence of nitrogen flow rate on microstructural and nanomechanical properties of Zr-N thin films prepared by pulsed DC magnetron sputtering

    Singh, A. / Kuppusami, P. / Khan, S. et al. | British Library Online Contents | 2013

    Back to top