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Electrical properties of SiO2/TiO2 high-k gate dielectric stack

Bera, M. K. / Maiti, C. K.

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Electrical properties of SiO2/TiO2 high-k gate dielectric stack

Bera, M. K. / Maiti, C. K.

Electrical properties of SiO2/TiO2 high-k gate dielectric stack

Bera, M. K. / Maiti, C. K.

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Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Electrical properties of SiO2/TiO2 high-k gate dielectric stack

Contributors:

Bera, M. K. (author) / Maiti, C. K. (author)

Published in:

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 9 ; 909-917

Publication date:

2006-01-01

Size:

9 pages

ISSN:

1369-8001

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.38152

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