The effect of applied negative bias voltage on the structure of Ti-doped a-C:H films deposited by FCVA: Fid-Bau Portal

The effect of applied negative bias voltage on the structure of Ti-doped a-C:H films deposited by FCVA

Wang, P. / Wang, X. / Chen, Y. / Zhang, G. / Liu, W. / Zhang, J.

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The effect of applied negative bias voltage on the structure of Ti-doped a-C:H films deposited by FCVA

Wang, P. / Wang, X. / Chen, Y. / Zhang, G. / Liu, W. / Zhang, J.

The effect of applied negative bias voltage on the structure of Ti-doped a-C:H films deposited by FCVA

Wang, P. / Wang, X. / Chen, Y. / Zhang, G. / Liu, W. / Zhang, J.

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

The effect of applied negative bias voltage on the structure of Ti-doped a-C:H films deposited by FCVA

Contributors:

Wang, P. (author) / Wang, X. (author) / Chen, Y. (author) / Zhang, G. (author) / Liu, W. (author) / Zhang, J. (author)

Published in:

APPLIED SURFACE SCIENCE ; 253 ; 3722-3726

Publication date:

2007-01-01

Size:

5 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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