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Plasma Etching for the Application to Low-K Dielectrics Devices

Lee, J. W. / Kim, H. W. / Han, J. W. / Kim, M. S. / Yoo, B. D. / Kim, M. H. / Lee, C. H. / Lim, C. H. / Hwang, S. K.

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Plasma Etching for the Application to Low-K Dielectrics Devices

Lee, J. W. / Kim, H. W. / Han, J. W. / Kim, M. S. / Yoo, B. D. / Kim, M. H. / Lee, C. H. / Lim, C. H. / Hwang, S. K.

Plasma Etching for the Application to Low-K Dielectrics Devices

Lee, J. W. / Kim, H. W. / Han, J. W. / Kim, M. S. / Yoo, B. D. / Kim, M. H. / Lee, C. H. / Lim, C. H. / Hwang, S. K.

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Document information

Title:

Plasma Etching for the Application to Low-K Dielectrics Devices

Contributors:

Lee, J. W. (author) / Kim, H. W. (author) / Han, J. W. (author) / Kim, M. S. (author) / Yoo, B. D. (author) / Kim, M. H. (author) / Lee, C. H. (author) / Lim, C. H. (author) / Hwang, S. K. (author) / Uskokovic, D. P.

Published in:

Research Trends in Contemporary Materials Science ; 113-118

MATERIALS SCIENCE FORUM ; 555

Publication date:

2007-01-01

Size:

6 pages

ISSN:

0255-5476

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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Plasma Chemistry in Etching

Flamm, Daniel L. | Springer Verlag | 1990