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Comparison of Chlorine Based In Situ Etching of 4H SiC Substrates
Comparison of Chlorine Based In Situ Etching of 4H SiC Substrates
Comparison of Chlorine Based In Situ Etching of 4H SiC Substrates
MacMillan, M. F. (author) / Loboda, M. J. (author) / Wan, J. W. (author) / Chung, G. Y. (author) / Carlson, E. P. (author) / Spaulding, M. J. (author) / Deese, D. (author) / Wright, N. / Johnson, C. M. / Vassilevski, K.
2007-01-01
4 pages
Article (Journal)
English
DDC:
620.11
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