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Effect of Substrate Bias on the Properties of Carbon Nitride Films Deposited on Hardalloy by DC Magnetron Sputtering
Effect of Substrate Bias on the Properties of Carbon Nitride Films Deposited on Hardalloy by DC Magnetron Sputtering
Effect of Substrate Bias on the Properties of Carbon Nitride Films Deposited on Hardalloy by DC Magnetron Sputtering
Tang, L.-q. (author) / Liu, J. (author) / Chen, Z.-g. (author) / Chen, C. (author) / Wu, Y.-j. (author)
MATERIALS PROTECTION -WUHAN- ; 40 ; 48-50
2007-01-01
3 pages
Article (Journal)
Unknown
DDC:
620.1
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