ITO films deposited on water-cooled flexible substrate by bias RF Magnetron Sputtering: Fid-Bau Portal

ITO films deposited on water-cooled flexible substrate by bias RF Magnetron Sputtering

Yang, Z. / Han, S. / Yang, T. / Ye, L. / Ma, H. / Cheng, C.

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ITO films deposited on water-cooled flexible substrate by bias RF Magnetron Sputtering

Yang, Z. / Han, S. / Yang, T. / Ye, L. / Ma, H. / Cheng, C.

ITO films deposited on water-cooled flexible substrate by bias RF Magnetron Sputtering

Yang, Z. / Han, S. / Yang, T. / Ye, L. / Ma, H. / Cheng, C.

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Document information

Title:

ITO films deposited on water-cooled flexible substrate by bias RF Magnetron Sputtering

Contributors:

Yang, Z. (author) / Han, S. (author) / Yang, T. (author) / Ye, L. (author) / Ma, H. (author) / Cheng, C. (author)

Published in:

APPLIED SURFACE SCIENCE ; 161 ; 279-285

Publication date:

2000-01-01

Size:

7 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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