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    Fast Diffusion in Germanium and Silicon Investigated by Lamp-Based Rapid Thermal Annealing

    New search for: Stolwijk, N.
    New search for: Lerner, L.
    New search for: Giese, A.
    New search for: Lerch, W.
    New search for: Lerch, W.
    New search for: Niess, J.

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    Fast Diffusion in Germanium and Silicon Investigated by Lamp-Based Rapid Thermal Annealing

    New search for: Stolwijk, N.
    New search for: Lerner, L.
    New search for: Giese, A.
    New search for: Lerch, W.
    New search for: Lerch, W.
    New search for: Niess, J.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Fast Diffusion in Germanium and Silicon Investigated by Lamp-Based Rapid Thermal Annealing

    New search for: Stolwijk, N.
    New search for: Lerner, L.
    New search for: Giese, A.
    New search for: Lerch, W.
    New search for: Lerch, W.
    New search for: Niess, J.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
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    Document information
    Title:

    Fast Diffusion in Germanium and Silicon Investigated by Lamp-Based Rapid Thermal Annealing

    Contributors:

    Stolwijk, N. (author) / Lerner, L. (author) / Giese, A. (author) / Lerch, W. (author) / Lerch, W. / Niess, J.

    Published in:

    Rapid Thermal Processing and beyond: Applications in Semiconductor Processing ; 35-44

    MATERIALS SCIENCE FORUM ; 573/574

    Publication date:

    2008-01-01

    Size:

    10 pages

    ISSN:

    0255-5476

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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