Phosphorus diffusion in germanium following implantation and excimer laser annealing

Wang, C. / Li, C. / Huang, S. et al. | British Library Online Contents | 2014

Germanium-doped Czochralski silicon: Oxygen precipitates and their annealing behavior

Chen, J. / Yang, D. / Li, H. et al. | British Library Online Contents | 2006

Oxygen behavior in germanium during melting laser thermal annealing

Milazzo, R. / Impellizzeri, G. / Cuscunà, M. et al. | British Library Online Contents | 2016

Internal gettering for germanium-doped Czochralski silicon: Treated by rapid-thermal-anneal based processing simulation

Chen, J. / Yang, D. / Ma, X. et al. | British Library Online Contents | 2009

Simulation of dopant diffusion and activation during flash lamp annealing

Zechner, C. / Matveev, D. / Zographos, N. et al. | British Library Online Contents | 2008